Ultrapure water (UPW), high-purity water or highly purified water (HPW) is water that has been purified to stringent specifications. Ultrapure water is a term commonly used in manufacturing to emphasize the fact that the water is treated to the highest levels of purity for all contaminant types, including organic and inorganic compounds, dissolved and particulate matter, and dissolved gases, as well as volatile and non-volatile compounds, reactive and inert compounds, and hydrophilic and hydrophobic compounds. In contrast to deionized (DI) water, UPW has organic particles and dissolved gases removed in addition to ions. Ultrapure water is typically prepared in three broadly-defined stages: pretreatment, primary treatment, and polishing/transport. While various industries use the term "ultrapure water", the exact definitions differ among industries. Standards for ultrapure water are defined by various groups for the power industry, semiconductor industry, and pharmaceutical industry. Water purity requirements of the semiconductor industry are generally the most stringent to prevent circuit faults at the nanometer scale.
Ultrapure water standards A number of organizations and groups develop and publish standards associated with the production of UPW. For microelectronics and power, they include Semiconductor Equipment and Materials International (SEMI) (microelectronics and photovoltaic), American Society for Testing and Materials International (ASTM International) (semiconductor, power), Electric Power Research Institute (EPRI) (power), American Society of Mechanical Engineers (ASME) (power), and International Association for the Properties of Water and Steam (IAPWS) (power). Pharmaceutical plants follow water quality standards as developed by pharmacopeias, of which three examples are the United States Pharmacopeia, European Pharmacopeia, and Japanese Pharmacopeia.
Purification process Water is typically sourced from city feed water or other local supplies and is taken through a series of purification steps that results in UPW. Some systems recycle used UPW water back into their UPW filtration system as this water is often cleaner than original sources. The purification steps have been broadly categorized into pretreatment, primary treatment, polishing, and/or distribution. These are not strict categories, and certain purification techniques may be present in one or more of the broader steps depending on specific engineering needs or author classification.
Pretreatment
Pretreatment produces "purified water" and focuses on removing contaminants with inexpensive methods prior to reverse osmosis or ion exchange during primary treatment. Coagulation (flocculation) and settling are used along with filtration to remove particulate matter that could clog reverse osmosis filters or ion exchange resin beds. Water softening by precipitation may be used for water sources with a relatively high concentrations of dissolved salts to prevent scaling during subsequent steps. The use of coagulation, flocculation, and settling are common in municipal water treatment systems meaning pretreatment may not be necessary depending on locale. For electronics (semiconductor) applications, aluminium salts along with lime-based water softeners are used to remove silica during pre-treatment. Transition metal ions like iron and manganese can be removed through oxidation followed by precipitation/flocculation methods. After bulk chemical treatments, pretreatment may include microfiltration or ultrafiltration to remove solids. Ion-exchange resins are commonly used in the pretreament step to further reduce the amount of scale-forming ions like calcium prior to reverse osmosis treatment as scaling can easily clog reverse osmosis membranes.
Primary treatment Primary treatment aims to remove ions, dissolved gasses, and organic contaminants from pre-treated water. In the 21st century, multiple-pass reverse osmosis is often the primary method used during this step to remove dissolved ions and dissolved organic solids. As a membrane-filtration method it also removes suspended solids as well. Reverse osmosis is often used in this step to remove both dissolved ions and dissolved organic material. Dissolved gases, including oxygen and volatile organic compounds, are removed during primary treatment by vacuum degassing or membrane degassing. Vacuum degassing towers were more common historically, but newer systems have trended towards used of membrane degasification. Ultraviolet (UV) light can used to sterilize purified water during primary treatment though UV treatment can also be left until the polishing stage.
Polishing Polishing is used in UPW systems to further reduce the already low-level of contaminants present after primary treatment. UV light is often used at this step to sterilize water. Further deionization is conducted using ion exchange beds or electrodeionization. Both inorganic ions (including silicate) and organic ions are removed through these processes. Ion-exchange beds used in the final polishing steps may be non-regenerable in contrast to those used in earlier steps. Ultrafiltration membranes with pore sizes of 0.45 μm are used to remove small particles including bacteria killed by UV sterilization. In semiconductor applications, additional filters with pore sizes ≤200 nm are typically used just before distribution to further reduce particle contamination. Particles must be filtered down to a "critical particle size" that is one-half of the smallest feature size on a semiconductor chip. For example, chips containing a 40 nm features should have all particles >20 nm (0.02 μm) removed to avoid contamination that prevents computer chips from functioning. After polishing, UPW is typically cycled continuously through the polishing system to prevent stagnation that can lead to bacterial growth.
Contamination sources and removal Bacteria, particles, organic carbon, ions, and dissolved gases are all present in typical municipal water systems and must be removed to create ultrapure water.
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